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Quantum interference of spontaneous-emission channels near the surface of Bi2Se3
International Journal of Modern Physics B ( IF 2.6 ) Pub Date : 2021-06-19 , DOI: 10.1142/s021797922150154x Dimitrios Karaoulanis 1 , Vassilios Yannopapas 1
International Journal of Modern Physics B ( IF 2.6 ) Pub Date : 2021-06-19 , DOI: 10.1142/s021797922150154x Dimitrios Karaoulanis 1 , Vassilios Yannopapas 1
Affiliation
We show that the quantum interference between two spontaneous emission channels can be significantly enhanced when a three-level V-type atom is placed near the surface of the topological insulator Bi 2 Se 3 . The enhancement of quantum interference is a result of the strong dependence of the spontaneous emission rate on the orientation of an atomic dipole relative to surface of the Bi 2 Se 3 at the frequencies of polaritonic-type excitations.
中文翻译:
Bi2Se3表面附近自发发射通道的量子干涉
我们表明,当将三能级 V 型原子放置在拓扑绝缘体表面附近时,可以显着增强两个自发发射通道之间的量子干涉。双 2 硒 3 . 量子干涉的增强是自发发射率强烈依赖于原子偶极子相对于表面的方向的结果双 2 硒 3 在极化子型激发的频率。
更新日期:2021-06-19
中文翻译:
Bi2Se3表面附近自发发射通道的量子干涉
我们表明,当将三能级 V 型原子放置在拓扑绝缘体表面附近时,可以显着增强两个自发发射通道之间的量子干涉。