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Direct Imprinting of Laser Field on Halide Perovskite Single Crystal for Advanced Photonic Applications
Laser & Photonics Reviews ( IF 9.8 ) Pub Date : 2021-06-17 , DOI: 10.1002/lpor.202100094 A. Y. Zhizhchenko 1, 2 , A. B. Cherepakhin 2 , M. A. Masharin 3 , A. P. Pushkarev 3 , S. A. Kulinich 1, 4 , A. P. Porfirev 5 , A. A. Kuchmizhak 1, 2 , S. V. Makarov 3
Laser & Photonics Reviews ( IF 9.8 ) Pub Date : 2021-06-17 , DOI: 10.1002/lpor.202100094 A. Y. Zhizhchenko 1, 2 , A. B. Cherepakhin 2 , M. A. Masharin 3 , A. P. Pushkarev 3 , S. A. Kulinich 1, 4 , A. P. Porfirev 5 , A. A. Kuchmizhak 1, 2 , S. V. Makarov 3
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Single crystal halide perovskites with microscale dimensions are an emerging class of objects for various advanced photonic and optoelectronic applications. Particularly, defect tolerance and broadband tunability of luminescence make them one of the most prospective candidates to develop microlasers for visible range. However, their post-processing by standard nanolithography methods face a number of problems related to worsening of their properties, thus making gentle laser processing one of best solutions for perovskite patterning. Here, it is shown that femtosecond laser irradiation of single-crystal halide perovskite CsPbBr3 allows for its precise and ultraclean ablation fully controlled at subwavelength scale by the intensity and polarization distribution of the complex laser field applied. Indeed, the extremely low thermal conductivity (over 300 times lower than that of silicon) and ultrafast thermalization rate makes it possible to reduce heat-affected zone and avoid melting layer contribution, while the high refractive index (larger than 2) provides high spatial resolution in case of irradiation of pre-patterned focusing perovskite nanostructures. These features allow for direct imprinting of the incident laser field at wavelength λ = 515 nm, creating micro-lens and various light-emitting metasurfaces with deeply subwavelength spatial resolution (down to λ/7).
中文翻译：
用于高级光子应用的卤化物钙钛矿单晶激光场的直接压印
具有微尺度尺寸的单晶卤化物钙钛矿是用于各种先进光子和光电应用的一类新兴物体。特别是，发光的缺陷容限和宽带可调性使它们成为开发可见光范围微激光器的最有前景的候选者之一。然而，它们通过标准纳米光刻方法进行的后处理面临许多与其性能恶化相关的问题，因此使温和的激光处理成为钙钛矿图案化的最佳解决方案之一。在这里，表明单晶卤化物钙钛矿 CsPbBr 3 的飞秒激光照射允许通过施加的复杂激光场的强度和偏振分布在亚波长范围内完全控制其精确和超清洁的消融。事实上，极低的热导率（比硅低 300 倍以上）和超快的热化速率使得减少热影响区和避免熔化层贡献成为可能，而高折射率（大于 2）提供高空间分辨率在照射预先图案化的聚焦钙钛矿纳米结构的情况下。这些特征允许直接压印波长 λ = 515 nm 的入射激光场，从而创建具有深亚波长空间分辨率（低至 λ/7）的微透镜和各种发光超表面。
更新日期：2021-08-15
中文翻译：
用于高级光子应用的卤化物钙钛矿单晶激光场的直接压印
具有微尺度尺寸的单晶卤化物钙钛矿是用于各种先进光子和光电应用的一类新兴物体。特别是，发光的缺陷容限和宽带可调性使它们成为开发可见光范围微激光器的最有前景的候选者之一。然而，它们通过标准纳米光刻方法进行的后处理面临许多与其性能恶化相关的问题，因此使温和的激光处理成为钙钛矿图案化的最佳解决方案之一。在这里，表明单晶卤化物钙钛矿 CsPbBr 3 的飞秒激光照射允许通过施加的复杂激光场的强度和偏振分布在亚波长范围内完全控制其精确和超清洁的消融。事实上，极低的热导率（比硅低 300 倍以上）和超快的热化速率使得减少热影响区和避免熔化层贡献成为可能，而高折射率（大于 2）提供高空间分辨率在照射预先图案化的聚焦钙钛矿纳米结构的情况下。这些特征允许直接压印波长 λ = 515 nm 的入射激光场，从而创建具有深亚波长空间分辨率（低至 λ/7）的微透镜和各种发光超表面。
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