Nowadays, advanced oxidation processes, particularly photocatalyst process and catalytic ozonation by ZnO nanoparticles, are the most efficient method of eliminating pharmaceuticals. The purpose of this study was to compare the efficiency of ultraviolet/zinc oxide (UV/ZnO) and ozone/zinc oxide (O₃/ZnO) techniques as advanced oxidation processes in the removal of trimethoprim (TMP) from aqueous solutions. The process consisted of 0.6 g/L of ozone (O₃), pH = 7.5 ± 0.5, TMP with a concentration of 0.5–5 mg/L, ZnO with a dose of 50–500 mg/L, 5–30 min reaction time, and 30–180 min contact time with UV radiation (6 W, 256 nm) in a continuous reactor. The high removal efficiency was achieved after 25 minutes when ZnO is used in 1 mg/L TMP under an operational condition at pH 7.5. When the concentration of the pollutant increased from 0.5 to 1, the average removal efficiency increased from 78% to 94%, and then, it remained almost constant. An increase in the reaction time from 5 to 25 minutes will cause the average elimination to increase from 84% to 94%. The results showed that the efficiency of O₃/ZnO process in the removal of TMP was 94%, while the removal efficiency of UV/ZnO process was 91%. The findings exhibited that the kinetic study followed the second-order kinetics, both processes. With regard to the results, the photocatalyst process and catalytic ozonation by ZnO nanoparticles can make acceptable levels for an efficient posttreatment. Finally, this combined system is proven to be a technically effective method for treating antibiotic contaminants.

中文翻译：

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紫外线/氧化锌 (UV/ZnO) 和臭氧/氧化锌 (O3/ZnO) 技术作为高级氧化工艺从水溶液中去除甲氧苄啶的效率比较

如今，高级氧化工艺，特别是光催化工艺和氧化锌纳米颗粒催化臭氧化，是消除药物的最有效方法。本研究的目的是比较紫外线/氧化锌 (UV/ZnO) 和臭氧/氧化锌 (O ₃ /ZnO) 技术作为高级氧化工艺从水溶液中去除甲氧苄啶 (TMP) 的效率。该过程包括 0.6 g/L 的臭氧 (O ₃), pH = 7.5 ± 0.5, TMP 浓度为 0.5-5 mg/L, ZnO 剂量为 50-500 mg/L, 反应时间为 5-30 min, 与紫外线辐射接触时间为 30-180 min ( 6 W，256 nm）在连续反应器中。当在 pH 7.5 的操作条件下以 1 mg/L TMP 使用 ZnO 时，25 分钟后实现了高去除效率。当污染物浓度从0.5增加到1时，平均去除效率从78%增加到94%，之后几乎保持不变。反应时间从 5 分钟增加到 25 分钟将导致平均消除率从 84% 增加到 94%。结果表明，O ₃的效率/ZnO工艺对TMP的去除率为94%，而UV/ZnO工艺的去除率为91%。研究结果表明，动力学研究遵循二级动力学，这两个过程。关于结果，ZnO 纳米粒子的光催化过程和催化臭氧化可以为有效的后处理提供可接受的水平。最后，这种组合系统被证明是一种处理抗生素污染物的技术上有效的方法。