Ethylenediamine with two −NH₂ functional groups was used as a critical complexing agent in chemical mechanical polishing (CMP) slurries for a high carbon chromium GCr15 bearing steel (equivalent to AISI 52100). The polishing performance and corresponding mechanism of −NH₂ functional groups were thoroughly investigated as a function of pH. It is revealed that, when polished with ethylenediamine and H₂O₂-based slurries, the material removal rate (MRR) and surface roughness R_a of GCr15 steel gradually decrease as pH increases. Compared with acidic pH of 4.0, at alkaline pH of 10.0, the surface film of GCr15 steel has much higher corrosion resistance and wear resistance, and thus the material removal caused by the pure corrosion and corrosion-enhanced wear are greatly inhibited, resulting in much lower MRR and R_a. Moreover, it is confirmed that a more protective composite film, consisting of more Fe³⁺ hydroxides/oxyhydroxides and complex compounds with −NH₂ functional groups of ethylenediamine, can be formed at pH of 10.0. Additionally, the polishing performance of pure iron and a medium carbon 45 steel exhibits a similar trend as GCr15 steel. The findings suggest that acidic pH could be feasible for amine groups-based complexing agents to achieve efficient CMP of iron-based metals.

具有两个 -NH ₂官能团的乙二胺被用作高碳铬 GCr15 轴承钢（相当于 AISI 52100）的化学机械抛光 (CMP) 浆料中的关键络合剂。-NH ₂官能团的抛光性能和相应机制作为pH的函数进行了彻底研究。结果表明，当用乙二胺和 H ₂ O ₂基浆料抛光时，材料去除率（MRR）和表面粗糙度R _a随着 pH 值的增加，GCr15 钢的含量逐渐降低。与酸性pH 4.0相比，碱性pH 10.0时，GCr15钢的表面膜具有更高的耐蚀性和耐磨性，从而大大抑制了纯腐蚀和腐蚀增强磨损引起的材料去除，从而导致降低 MRR 和R _a。此外，证实了由更多 Fe ³⁺氢氧化物/羟基氧化物和具有 -NH _{2 的}复合物组成的更具保护性的复合膜乙二胺的官能团，可在pH值为10.0时形成。此外，纯铁和中碳 45 钢的抛光性能表现出与 GCr15 钢相似的趋势。研究结果表明，酸性 pH 值对于基于胺基的络合剂来说是可行的，以实现铁基金属的高效 CMP。