当前位置: X-MOL 学术ACS Sustain. Chem. Eng. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Biodegradable Anti-Ultraviolet Film from Modified Gallic Acid Cross-linked Gelatin
ACS Sustainable Chemistry & Engineering ( IF 7.1 ) Pub Date : 2021-06-15 , DOI: 10.1021/acssuschemeng.1c00085
Linxin Guo 1, 2 , Taotao Qiang 1 , Yangmin Ma 3 , Longfang Ren 1 , Chao Zhu 4
Affiliation  

The use of leather production waste to prepare degradable films is a sustainable production concept that can improve resource utilization and reduce the environmental pollution caused by traditional packaging waste. In this study, a biodegradable anti-ultraviolet film was prepared using gelatin obtained from tanning waste as the raw material and modified gallic acid as a cross-linking agent. The aldehyde group in the modified gallic acid reacts with the amino group in the gelatin molecule to form a stable covalent bond, which increases the cross-linking degree of the gelatin film. Compared with the conventional gelatin film, the modified gallic acid cross-linked gelatin film exhibited stronger tensile strength (6.357 MPa) and higher elongation at break (155.11%). The anti-ultraviolet capability of the film significantly increased as the conjugation system was enhanced owing to the formation of a Schiff base structure between the modified gallic acid and gelatin molecule, with strong UV absorption (T < 1%) in the range of 200–458 nm. The modified gallic acid cross-linked gelatin films also showed good antioxidant and antibacterial properties and excellent biodegradability, indicating its application potential in the packaging field.

中文翻译:

由改性没食子酸交联明胶制成的可生物降解抗紫外线薄膜

利用皮革生产废料制备可降解薄膜是一种可持续的生产理念,可以提高资源利用率,减少传统包装废料对环境的污染。本研究以鞣革废料中提取的明胶为原料,以改性没食子酸为交联剂,制备了一种可生物降解的抗紫外线薄膜。改性没食子酸中的醛基与明胶分子中的氨基反应形成稳定的共价键,增加了明胶膜的交联度。与常规明胶膜相比,改性没食子酸交联明胶膜表现出更强的拉伸强度(6.357 MPa)和更高的断裂伸长率(155.11%)。T < 1%) 在 200–458 nm 范围内。改性没食子酸交联明胶薄膜还表现出良好的抗氧化和抗菌性能以及优异的生物降解性,表明其在包装领域的应用潜力。
更新日期:2021-06-28
down
wechat
bug