Abstract Surfactants after their use are discharged into aquatic ecosystems. These compounds may be harmful to fauna and flora in surface waters or can be toxic for microorganisms of the activated sludge or biofilm in WWTP. In order to determine effectiveness of different advanced oxidation processes on the degradation of surfactants, in this study the degradation of anionic surfactants in aqueous solution using photolysis by 254 nm irradiation and by advanced oxidation process in a H2O2/UVC system was investigated. Two representatives of anionic surfactants, linear alkyl benzene sulphonate (LAS-R11–14) and ether carboxylic derivate (EC-R12–14E10) were tested. The influence of pH, initial surfactant concentration and dose of hydrogen peroxide on the degradation was also studied. Results show outstanding effectiveness of the H2O2/UVC system in the removal of surfactant from aqueous solutions.

中文翻译：

---

H2O2/UVC体系中UVC光解和高级氧化过程中阴离子表面活性剂的去除效率

摘要 表面活性剂使用后会排放到水生生态系统中。这些化合物可能对地表水中的动植物群有害，或者对污水处理厂中活性污泥或生物膜的微生物有毒。为了确定不同高级氧化工艺对表面活性剂降解的有效性，在本研究中，研究了使用 254 nm 辐射光解和在 H2O2/UVC 系统中通过高级氧化工艺降解水溶液中的阴离子表面活性剂。测试了阴离子表面活性剂的两种代表，直链烷基苯磺酸盐 (LAS-R11–14) 和醚羧酸衍生物 (EC-R12–14E10)。还研究了 pH、表面活性剂初始浓度和过氧化氢剂量对降解的影响。