This study is to investigate the role of O₃ on NO and NO₂ oxidations to selective formations of NO₂ ⁻ and NO₃ ⁻ in plasma-treated water. Two plasma reactors, a surface dielectric-barrier discharge (DBD) and a coaxial DBD jet, are employed to water treatment with a working gas primarily consisting of N₂ and O₂. Results of surface DBD show that O₃ first is increased with plasma treatment time, reaching a maximum, and then decreased. NO takes time to grow and the grow of NO is accompanied by O₃ decrease. Formations of NO₂ ⁻ and NO₃ ⁻ are associated with gas-phase nitrogen oxides while the presence of O₃ has a critical influence on a selective formation of NO₂ ⁻ and NO₃ ⁻. The strong oxidation of O₃ favors the formation of NO₃ ⁻ while inhibits NO₂ ⁻ formation. O₃ serving as an inhibitor of NO₂ ⁻ is confirmed with the DBD jet experiment where O₃ is admixed in the downstream of the post discharge. O₃ enhancement on NO₃ ⁻ formation is demonstrated by exposing water to a synthetic NO gas with and without O₃. In addition to O₃, the presence of water vapor in the working gas, presumably facilitating formation of HNO₂ and HNO₃, greatly promotes NO₂ ⁻ and NO₃ ⁻ concentrations in solution. This is thought to be due to the stronger dissolution susceptibility and the relatively larger rate constant of HNO₂ and HNO₃ than those of N₂O₃ and N₂O₅. Finally, based on observations obtained here, a schematic roadmap of selective NO₂ ⁻ and NO₃ ⁻ formations is presented.

本研究旨在研究 O ₃对等离子处理水中NO 和 NO ₂氧化选择性形成 NO ₂ ^-和 NO ₃ ^{- 的}作用。两个等离子体反应器，一个表面介电阻挡放电 (DBD) 和一个同轴 DBD 射流，用于使用主要由 N ₂和 O ₂组成的工作气体进行水处理。表面DBD结果表明O ₃随着等离子体处理时间的增加先增加，达到最大值，然后减少。NO的生长需要时间，NO的生长伴随着O _{3 的}减少。NO ₂ ^-和NO ₃ ^{- 的形成}与气相氮氧化物有关，而 O ₃的存在对 NO ₂ ^-和 NO ₃ ^-的选择性形成具有关键影响。O ₃的强氧化有利于NO ₃ ^-的形成，同时抑制NO ₂ ^{- 的}形成。O ₃作为NO ₂ ^-的抑制剂被DBD喷射实验证实，其中O ₃在后放电的下游混合。通过将水暴露于含有和不含 O 的合成 NO 气体中，证明了O ₃对 NO ₃ ^-形成的增强作用₃ . 除了O _{3 之外}，工作气体中水蒸气的存在可能促进了HNO ₂和HNO _{3 的}形成，极大地促进了溶液中的NO ₂ ^-和NO ₃ ^-浓度。这被认为是由于HNO ₂和HNO ₃比N ₂ O ₃和N ₂ O ₅更强的溶解敏感性和相对更大的速率常数。最后，基于此处获得的观察，选择性 NO ₂ ^-和 NO ₃ ^-的示意性路线图 编队提出。