The influence of low-pressure and low-temperature hydrogen plasma on a pure molybdenum sample implanted with caesium is investigated by means of sputtering-XPS. A portion of the sample was exposed to the plasma, while the rest of the sample was covered by stainless steel and thus shielded from direct plasma flux. The results show that the part of the sample exposed to the plasma exhibits both on and beneath the surface an increased amount of H₂O and MoO₂ with respect to the covered sample part which can be explained by a chemical reduction of MoO₃ oxides by the hydrogen plasma species. The XPS Cs lines show oxidation peaks. A sputtering depth of roughly 13 nm is necessary to recover an identical spectrum, indicating that the plasma changes the chemical composition of the implanted samples not only on the surface but also inside the material.

通过溅射-XPS研究了低压低温氢等离子体对注入铯的纯钼样品的影响。样品的一部分暴露在等离子体中，而样品的其余部分被不锈钢覆盖，从而避免了直接的等离子体通量。结果表明，与覆盖的样品部分相比，暴露于等离子体的样品部分在表面上和表面下均表现出增加的 H ₂ O 和 MoO ₂量，这可以通过 MoO ₃的化学还原来解释氢等离子体物质的氧化物。XPS Cs 线显示氧化峰。大约 13 nm 的溅射深度是恢复相同光谱所必需的，这表明等离子体不仅在表面而且在材料内部改变了注入样品的化学成分。