Understanding the dissolution kinetics of resist materials is essential for their efficient development. In this study, we investigated the dissolution kinetics of poly(4-hydroxystyrene) (PHS) with a weight-average molecular weight (M _w) of 8000–30 000 and a polydispersity index (M _w /M _n) of 1.07–1.20. The dissolution kinetics of PHS films was observed in tetramethylammonium hydroxide (TMAH) aqueous developers by a quartz crystal microbalance (QCM) method. The TMAH concentration was changed from 0 to 2.38wt%. The formation of a thick transient swelling layer at these M _w /M _n values was suppressed compared with that at M _w /M _n>2. QCM data were analyzed using the polynomial regression to clarify the effects of M _w and M _w /M _n on the dissolution kinetics in a narrow polydispersity region. Both dissolving and swelling kinetics largely depended on M _w/M _n. M _w had little effect in 2.38wt% TMAH developer; however, it had a large effect on the swelling when 2.38wt% TMAH developer was diluted.

了解抗蚀剂材料的溶解动力学对其有效开发至关重要。在这项研究中，我们用其重均分子量（研究聚（4-羟基苯乙烯）（PHS）的溶解动力学中号 _瓦特的8000-30 000）和多分散性指数（中号 _瓦特 / M _Ñ的1.07-1.20） . 通过石英晶体微量天平 (QCM) 方法在四甲基氢氧化铵 (TMAH) 水性显影剂中观察 PHS 薄膜的溶解动力学。TMAH 浓度从 0 变为 2.38wt%。厚的瞬时膨胀层中的这些地层中号 _瓦特 / M _Ñ值被抑制与在比较中号 _瓦特 / M _Ñ>2. 使用多项式回归分析 QCM 数据，以阐明M _w和M _w /M _n对狭窄多分散区域中溶出动力学的影响。溶解和溶胀动力学在很大程度上取决于M _w / M _n。M _w在 2.38wt% TMAH 显影剂中影响不大；然而，当稀释 2.38wt% TMAH 显影剂时，它对溶胀有很大影响。