In this study, Au grating with a subwavelength period was fabricated on low-melting glass via direct imprint lithography. The Au film was imprinted at 425 °C and 5 kN using SiC as a mold. The period, grating depth, and fill factor of the mold were 300 nm, ∼240 nm, and 0.5, respectively. Consequently, Au grating with a pitch, depth, and fill factor of 300 nm, ∼110 nm, and 0.7, respectively, was obtained. The transverse magnetic (TM, electric field vector perpendicular to the grating) spectra at an incident angle of 40° exhibited sharp peaks at a wavelength of 642 nm, and the TM transmittance and extinction ratio were 30% and 12.9 dB, respectively. The maximum extinction ratio was 19.0 dB at a wavelength and incident angle of 1 µm and 60°, respectively. This process is simpler and less expensive than the conventional fabrication processes.

在这项研究中，通过直接压印光刻在低熔点玻璃上制造了亚波长周期的 Au 光栅。使用 SiC 作为模具，在 425 °C 和 5 kN 下压印 Au 膜。模具的周期、光栅深度和填充因子分别为 300 nm、~240 nm 和 0.5。因此，获得了间距、深度和填充因子分别为 300 nm、~110 nm 和 0.7 的 Au 光栅。入射角为40°的横向磁（TM，垂直于光栅的电场矢量）光谱在642 nm波长处表现出尖峰，TM透射率和消光比分别为30%和12.9 dB。在波长和入射角分别为 1 µm 和 60° 时，最大消光比为 19.0 dB。该工艺比传统的制造工艺更简单且成本更低。