Laser interference patterning or lithography has been used in variety of the applications using, patterning, masking and processing structures at top of material. It offers fast processing over as large areas can be processed simultaneously. Additionally, fine patterns are possible to achieve both in micro and sub-micro scale. In this manuscript is presented novel concept to combine interference patterning and high-pressure processing environment. With aid of high-pressure system, it is possible to control processing environment and add co-solvents in desired state (liquid, gas, supercritical) and use developed system as controlled reactive environment in the future studies. Two systems were developed and assembled for testing and proofing the concept. The results of the two 4-beam interference systems (lens- and mirror-based) are presented and compared.

激光干涉图案化或光刻已用于在材料顶部使用、图案化、掩蔽和处理结构的各种应用。它提供快速处理，因为可以同时处理大面积。此外，可以在微观和亚微观尺度上实现精细图案。在此手稿中提出了将干涉图案与高压处理环境相结合的新颖概念。在高压系统的帮助下，可以控制加工环境并添加所需状态（液体、气体、超临界）的助溶剂，并在未来的研究中使用开发的系统作为受控反应环境。开发和组装了两个系统，用于测试和验证概念。