In this paper, the influence of Al/Ni reactive multilayer films on laser ablation induced plasma process is investigated. Laser ablation of single Ni layer and Al/Ni RMFs was performed by nanosecond pulsed laser beam with 1064 ​nm wavelength. The characterization methods were applied for researching the structure and chemical composition with transmission electron microscopy, X-ray photoelectron spectroscopy, and atom probe tomography. The effects of the Al/Ni RMFs on the plasma properties were then systematically investigated in terms of the electron temperature, density and ionization. Meanwhile, measurements of the plasma expansion velocity were performed using ICCD system. The results exhibit improved plasma behaviors with high electron temperature, fast expansion velocity and violent ablation phenomenon of Al/Ni RMFs in comparison with the Ni film, which is significant for broadening the potentials in military applications.

本文研究了Al/Ni反应性多层膜对激光烧蚀诱导等离子体工艺的影响。通过波长为 1064 nm 的纳秒脉冲激光束对单层 Ni 和 Al/Ni RMF 进行激光烧蚀。将表征方法应用于透射电子显微镜、X射线光电子能谱和原子探针断层扫描的结构和化学成分研究。然后在电子温度、密度和电离方面系统地研究了 Al/Ni RMF 对等离子体特性的影响。同时，使用ICCD系统进行等离子体膨胀速度的测量。结果表明，在高电子温度下等离子体行为得到改善，