High stable nickel nanoparticles (NiNPs) have been successfully synthesized from nickel chloride as the precursor through a simple one-pot solvothermal process. A systematic investigation of the reaction parameters, namely, effects of reaction temperature, pH of precursor solution, the concentration of reactants, and reaction time on the formation of NiNPs, was carried out to obtain the optimal values for the synthesis. The optimum reaction temperature, pH, NiCl 2 ·6H 2 O concentration, and reaction time are 190°C, pH 9, 0.1 M, and 24 h. The characteristic peaks of NiNPs have been confirmed by the Fourier transformer infra-red and surface plasmon resonance, with the presence of –OH stretching bands at 3,593 and 603 cm −1 (interaction with Ni and NiO) and λ max 265 nm, respectively. The X-ray diffraction and transmission electron microscope demonstrated the particle size of about 24 nm (by Scherrer) and 49 nm (Image-J), respectively, with the face center cubic phase. The synthesized NiNPs showed good stability, where the degradation of NiNPs was completed at 800°C with more than 97% residue as depicted by the thermogravimetry analysis. The synthesized NiNPs can be used as fillers to enhance the thermal, mechanical, and electrical properties of polymeric materials. Graphical abstract

中文翻译：

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高稳定性镍纳米粒子的一锅溶剂热合成及表征

以氯化镍为前驱体，通过简单的一锅溶剂热法成功合成了高稳定性镍纳米粒子 (NiNPs)。系统地研究了反应参数，即反应温度，前体溶液的pH，反应物的浓度和反应时间对NiNPs形成的影响，以获得合成的最佳值。最佳反应温度，pH，NiCl 2·6H 2 O浓度和反应时间为190°C，pH 9、0.1 M和24 h。NiNPs 的特征峰已通过傅立叶变换红外和表面等离子体共振证实，分别在 3,593 和 603 cm -1（与 Ni 和 NiO 相互作用）和 λ max 265 nm 处存在 –OH 伸缩带。X 射线衍射和透射电子显微镜显示粒径分别约为 24 nm（由 Scherrer）和 49 nm（Image-J），具有面心立方相。合成的 NiNPs 表现出良好的稳定性，其中 NiNPs 的降解在 800°C 下完成，如热重分析所示，残留超过 97%。合成的 NiNPs 可用作填料以增强聚合物材料的热、机械和电性能。图形概要 合成的 NiNPs 可用作填料以增强聚合物材料的热、机械和电性能。图形概要 合成的 NiNPs 可用作填料以增强聚合物材料的热、机械和电性能。图形概要