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The multi-optics high-resolution absorption x-ray spectrometer (HiRAXS) for studies of materials under extreme conditions
Review of Scientific Instruments ( IF 1.3 ) Pub Date : 2021-05-10 , DOI: 10.1063/5.0043685
S Stoupin 1 , D B Thorn 1 , N Ose 1 , L Gao 2 , K W Hill 2 , Y Ping 1 , F Coppari 1 , B Kozioziemski 1 , A Krygier 1 , H Sio 1 , J Ayers 1 , M Bitter 2 , B Kraus 2 , P C Efthimion 2 , M B Schneider 1
Affiliation  

We report the development of a high-resolution spectrometer for extended x-ray absorption fine structure (EXAFS) studies of materials under extreme conditions. A curved crystal and detector in the spectrometer are replaceable such that a single body is employed to perform EXAFS measurements at different x-ray energy intervals of interest. Two configurations have been implemented using toroidal crystals with Ge 311 reflection set to provide EXAFS at the Cu K-edge (energy range 8.9–9.8 keV) and Ge 400 reflection set to provide EXAFS at the Ta L3-edge (9.8–10.7 keV). Key performance characteristics of the spectrometer were found to be consistent with design parameters. The data generated at the National Ignition Facility have shown an ≃3 eV spectral resolution for the Cu K-edge configuration and ≃6 eV for the Ta L3-edge configuration.

中文翻译:

用于在极端条件下研究材料的多光学高分辨率吸收 X 射线光谱仪 (HiRAXS)

我们报告了一种高分辨率光谱仪的开发,用于在极端条件下对材料进行扩展 X 射线吸收精细结构 (EXAFS) 研究。光谱仪中的弯曲晶体和检测器是可更换的,因此可以使用单个主体在感兴趣的不同 X 射线能量区间执行 EXAFS 测量。使用环形晶体实现了两种配置,其中 Ge 311 反射设置在 Cu K 边缘(能量范围 8.9-9.8 keV)提供 EXAFS,Ge 400 反射设置在 Ta L3 边缘(9.8-10.7 keV)提供 EXAFS . 发现光谱仪的关键性能特征与设计参数一致。National Ignition Facility 生成的数据显示,Cu K 边缘配置的光谱分辨率为 ≃3 eV,Ta L3 边缘配置的光谱分辨率为 ≃6 eV。
更新日期:2021-05-28
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