As a novel processing technology, plasma spray-physical vapor deposition (PS-PVD) enables coatings to be deposited mainly from vapor phase. To explore the potential advantages of such a plasma spray-based processes, the deposition mechanisms and their dependency on process conditions should be better investigated. In this work, yttria partially stabilized zirconia thermal barrier coatings with quasi-columnar structure were fabricated by PS-PVD. The morphologies of the coatings for each set of deposition durations (from 30 ms to 100 s) and spray distances range from 800 to 1000 mm were studied. Besides, a design-of-experiment was used to investigate the non-line-of-sight capability of PS-PVD coatings, which were deposited on flat superalloy substrates that mounted on a static cylindrical graphite holder approximately 40 mm in diameter at various deposition angle (from 0° to 270°). Moreover, the residual stresses in the topcoat and thermally grown oxide scale were measured non-destructively using Raman spectroscopy and photoluminescence piezospectroscopy, respectively. The stage growth process of PS-PVD coatings was obtained by electron backscattered diffraction characterization of the crystal orientations and distributions of crystal size. The various microstructures of the coatings help to improve the understanding of the deposition mechanisms of PS-PVD coatings.

作为一种新颖的处理技术，等离子喷涂物理气相沉积（PS-PVD）使涂层主要从气相沉积。为了探索这种基于等离子喷涂的工艺的潜在优势，应该更好地研究沉积机理及其对工艺条件的依赖性。在这项工作中，通过PS-PVD制备了具有准柱状结构的氧化钇部分稳定的氧化锆热障涂层。研究了每组沉积时间（从30 ms到100 s）和喷涂距离在800到1000 mm范围内涂层的形貌。此外，还通过实验设计来研究PS-PVD涂层的非视线性能，将其沉积在扁平的高温合金基底上，该基底以各种沉积角度（0°至270°）安装在直径约40 mm的静态圆柱形石墨支架上。此外，分别使用拉曼光谱法和光致发光压电光谱法非破坏性地测量了面漆中的残余应力和热生长的氧化皮。PS-PVD涂层的阶段生长过程通过晶体取向和晶体尺寸分布的电子背散射衍射表征获得。涂层的各种微观结构有助于增进对PS-PVD涂层沉积机理的了解。分别使用拉曼光谱法和光致发光压电光谱法非破坏性地测量了面漆和热生长氧化皮中的残余应力。PS-PVD涂层的阶段生长过程通过晶体取向和晶体尺寸分布的电子背散射衍射表征获得。涂层的各种微观结构有助于增进对PS-PVD涂层沉积机理的了解。分别使用拉曼光谱法和光致发光压电光谱法非破坏性地测量了面漆和热生长氧化皮中的残余应力。PS-PVD涂层的阶段生长过程通过晶体取向和晶体尺寸分布的电子背散射衍射表征获得。涂层的各种微观结构有助于增进对PS-PVD涂层沉积机理的了解。