Comparison of HMDSO and HMDSN as precursors for high-barrier plasma-polymerized multilayer coating systems on polyethylene terephthalate films,Plasma Processes and Polymers

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Comparison of HMDSO and HMDSN as precursors for high-barrier plasma-polymerized multilayer coating systems on polyethylene terephthalate films
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2021-05-25 , DOI: 10.1002/ppap.202100018
Montgomery Jaritz ₁ , Philipp Alizadeh ₁ , Stefan Wilski ₁ , Lara Kleines ₁ , Rainer Dahlmann ₁

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Hexamethyldisiloxane (HMDSO)- and hexamethyldisilazane (HMDSN)-based plasma polymeric coatings are compared as elements of multilayer barrier coatings, consisting of an alternating structure of organosilicon and silicon oxide layers. Furthermore, these coatings are examined with regard to their deposition rate, critical layer thickness, surface roughness, atomic composition, and gas permeability. It is investigated how these attributes correlate in the overall barrier performance of a multilayer coating system. The concluded examinations show that HMDSN delivers best overall barrier performances as a precursor at high energy densities. For lower energy densities, the use of HMDSO is preferable. Intermediate layer thickness should not exceed six nanometers for best barrier performance in the given experiment configuration.

中文翻译：

比较 HMDSO 和 HMDSN 作为聚对苯二甲酸乙二醇酯薄膜上高阻隔等离子体聚合多层涂层系统的前体

将六甲基二硅氧烷 (HMDSO) 和六甲基二硅氮烷 (HMDSN) 基等离子聚合物涂层作为多层阻隔涂层的元素进行比较，该涂层由有机硅和氧化硅层的交替结构组成。此外，还对这些涂层的沉积速率、临界层厚度、表面粗糙度、原子组成和气体渗透性进行了检查。研究了这些属性如何与多层涂层系统的整体阻隔性能相关。总结的检查表明，HMDSN 作为前体在高能量密度下提供了最佳的整体阻隔性能。对于较低的能量密度，最好使用 HMDSO。在给定的实验配置中，为了获得最佳阻隔性能，中间层厚度不应超过 6 纳米。

更新日期：2021-05-25

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