The influence of ultraviolet (UV) irradiation on the structural, linear optical and non-linear optical properties of 2-Amino-4-(2-chlorophenyl)-6-ethyl-5-oxo-5,6-dihydro-4H-pyrano [3,2-c] quinoline-3-carbonitrile (Ch-HPQ) thin films is elaborated. The morphology of the UV irradiated, for different irradiation times, Ch-HPQ thin films is studied using both scanning electron microscopy and X-ray diffraction and compared with the UV non irradiated one. The transmittance and reflectance spectra of Ch-HPQ thin films are studied based on spectrophotometric measurements in the spectral range (200–2500) nm. Several parameters (e.g. the molar extinction coefficient, the onset and optical energy gap values) are calculated from the absorption spectra. Dispersion of the studied material is explained by Wemple and Di Domenico single-oscillator model. The influence of UV irradiation on the loss functions is discussed. The theoretical calculations of the non-linear optical parameters such as third order non-linear susceptibility and the non-linear refractive index are investigated from linear optical parameters using semi-empirical relations. The homogeneity of Ch-HPQ thin films are found to be stable under the UV irradiation which recommends using this material in optoelectronic applications.

紫外线（UV）辐射对2-氨基-4-（2-氯苯基）-6-乙基-5-氧代-5,6-二氢-4H-吡喃基的结构，线性光学和非线性光学性质的影响详细说明了[3,2-c]喹啉-3-腈（Ch-HPQ）薄膜。使用扫描电子显微镜和X射线衍射研究了在不同照射时间下Ch-HPQ薄膜的紫外线照射形态，并与未照射的紫外线进行了比较。基于分光光度法在光谱范围（200–2500）nm内对Ch-HPQ薄膜的透射光谱和反射光谱进行了研究。从吸收光谱中计算出几个参数（例如摩尔消光系数，起始和光能隙值）。用Wemple和Di Domenico单振子模型解释了所研究材料的色散。讨论了紫外线辐射对损失函数的影响。使用半经验关系从线性光学参数研究了非线性光学参数（例如三阶非线性磁化率和非线性折射率）的理论计算。发现Ch-HPQ薄膜的均匀性在紫外线照射下稳定，这建议在光电应用中使用该材料。