Nb₃Sn is an alternative material for future superconducting accelerators. With its higher critical temperature and superheating field than that of niobium, its application in the field of SRF is a great advantage. In this paper, the magnetron sputtering method is applied to prepare the Nb₃Sn thin film on the oxygen-free copper substrate by the stoichiometric target—the ratio of 3:1 of niobium to tin, so as to explore the effect of different annealing air pressures on the properties of the film in detail. The film crystal structure, morphology, composition, and superconducting critical temperature were characterized by XRD, SEM, EDS, and MPMS. After in-situ annealing, XRD and MPMS reveal the existence of Nb₃Sn crystal. The compact film with good surface properties is free of cracks and tin islands. The superconducting critical temperature reaches 13.6 K. The results show that if annealing was conducted in Ar atmosphere at 1 Pa, the obtained film exhibits better performance with a sharp transition from the superconducting state to the normal state.

Nb ₃ Sn 是未来超导加速器的替代材料。与铌相比，它具有更高的临界温度和过热场，在SRF领域的应用具有很大的优势。本文采用磁控溅射法，以化学计量靶材——铌锡比为3:1，在无氧铜基片上制备Nb ₃ Sn薄膜，探讨不同退火工艺的效果。气压对薄膜性能的影响。通过XRD、SEM、EDS和MPMS对薄膜的晶体结构、形貌、成分和超导临界温度进行了表征。原位退火后，XRD 和 MPMS 揭示了 Nb ₃的存在锡晶体。具有良好表面性能的致密薄膜没有裂纹和锡岛。超导临界温度达到13.6 K。结果表明，如果在1 Pa的Ar气氛中进行退火，获得的薄膜表现出更好的性能，从超导状态到正常状态的急剧转变。