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Laser Metal Deposition On-Line Monitoring via Plasma Emission Spectroscopy and Spectral Correlation Techniques
IEEE Journal of Selected Topics in Quantum Electronics ( IF 4.3 ) Pub Date : 2021-04-26 , DOI: 10.1109/jstqe.2021.3075489
Jose J. Valdiande , Jesus Mirapeix , Jaume Nin , Eloi Font , Carlos Seijas , Jose Miguel Lopez-Higuera

Plasma spectroscopic techniques focused on the analysis of the plasma background radiation have been studied to enable an efficient on-line monitoring of a laser metal deposition process. The influence of different process parameters and elements, such as laser power, process speed, powder feeding rate and different powder and substrate compositions has been analyzed by means of several experimental trials. The resulting cladding patch analyzes via visual inspection and macrographs have been correlated with their associated spectroscopic monitoring signals. These studies have indicated that on-line quality monitoring of the laser metal deposition process is feasible by means of the proposed solutions, avoiding the identification and use of plasma emission lines. The latter improves the computational performance and avoids, not only the identification of each emission line, but also their specific sensitivity to certain defects. Spectral correlation techniques have also been proposed for monitoring purposes, thus enabling a more quantitative analysis.

中文翻译:


通过等离子体发射光谱和光谱相关技术进行激光金属沉积在线监测



已经研究了专注于等离子体背景辐射分析的等离子体光谱技术,以实现激光金属沉积过程的有效在线监测。通过多次实验试验,分析了不同工艺参数和元素(例如激光功率、加工速度、送粉速率以及不同粉末和基材成分)的影响。通过目视检查和宏观照片进行的熔覆贴片分析已与其相关的光谱监测信号相关联。这些研究表明,通过所提出的解决方案,激光金属沉积过程的在线质量监控是可行的,避免了等离子体发射线的识别和使用。后者提高了计算性能,不仅避免了每条发射线的识别,而且还避免了它们对某些缺陷的特定敏感性。还提出了频谱相关技术用于监测目的,从而实现更加定量的分析。
更新日期:2021-04-26
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