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Influence of Protection Layers on Thermal Stability of Nitride Thin Films
Physica Status Solidi-Rapid Research Letters ( IF 2.5 ) Pub Date : 2021-05-18 , DOI: 10.1002/pssr.202100178
Andriy Zakutayev 1 , Craig L. Perkins 1
Affiliation  

Nitrides are commonly studied for their properties relevant to numerous coating applications, and have been recently used to synthesize newly predicted materials in thin-film form. However, the thermodynamic stability of such nitride materials is difficult to experimentally evaluate, due to the limited thermal budget of thin films. Herein, it is shown that the thermal stability of nitride films can be extended using protection layers. Specifically, it is found that zirconium nitride (ZrN) thin films are stable up to at least 1200 °C annealing temperature in N2 atmosphere, if aluminum nitride (AlN) diffusion barriers and capping layers are used. X-ray diffraction (XRD) measurements show the expected thermodynamically stable rocksalt structure of ZrN, and scanning electron microscopy (SEM) confirms the compact microstructure of these ZrN films. Without such protection layers, the transient bixbyite Zr2ON2 phase and high-temperature ZrSi2 phase are observed after annealing by XRD, SEM, and Auger electron spectroscopy (AES), due to side reaction with the native surface oxide (ZrOx) and the substrate (Si), respectively. These results demonstrate that protection layers are beneficial to increase the thermal budget of nitride thin films, for evaluating rgw thermodynamic stability of new nitride materials, for capturing transient metastable phases during crystallization, and for using functional nitride coatings in extreme environments.

中文翻译:

保护层对氮化硅薄膜的热稳定性的影响

氮化物通常被用于研究有关的许多涂料应用它们的性质,并且最近已用于合成在薄膜形式新预测的材料。然而,由于薄膜的热预算有限,这种氮化物材料的热力学稳定性难以通过实验评估。本文中,示出的是氮化物膜的热稳定性可使用保护层来延长。具体而言,发现氮化锆(氮化锆)薄膜是稳定的高达至少1200℃的退火温度的N 2气氛中,使用如果氮化铝(AlN)扩散阻挡层和覆盖层。X 射线衍射 (XRD) 测量表明 ZrN 具有预期的热力学稳定岩盐结构,并且扫描电子显微镜 (SEM) 证实了这些 ZrN 薄膜的致密微观结构。如果没有这样的保护层,所述瞬态方铁锰矿的Zr 2 ON 2相和高温ZrSi 2通过XRD,SEM和俄歇电子能谱(AES)退火后,观察到相,由于与天然表面氧化物的副反应的(ZrO X)与基板(Si)的,分别。这些结果表明,保护层是有益的,以增加氮化物薄膜的热预算,用于评估的新氮化物材料RGW热力学稳定性,结晶化过程中捕获瞬态亚稳相,和用于在极端环境中使用功能性氮化物涂层。
更新日期:2021-05-18
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