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A novel laser shock post-processing technique on the laser-induced damage resistance of 1ω HfO2/SiO2 multilayer coatings
High Power Laser Science and Engineering ( IF 5.2 ) Pub Date : 2021-05-14 , DOI: 10.1017/hpl.2021.4
Tangyang Pu , Wenwen Liu , Yueliang Wang , Xiaoming Pan , Leiqing Chen , Xiaofeng Liu

The laser shock processing implemented by a laser-induced high-pressure plasma which propagates into the sample as a shockwave is innovatively applied as a post-processing technique on HfO2/SiO2 multilayer coatings for the first time. The pure mechanical post-processing has provided evidence of a considerable promotion effect of the laser-induced damage threshold, which increased by a factor of about 4.6 with appropriate processing parameters. The promotion mechanism is confirmed to be the comprehensive modification of the intrinsic defects and the mechanical properties, which made the applicability of this novel post-processing technique on various types of coatings possible. Based on experiments, an interaction equation for the plasma pressure is established, which clarifies the existence of the critical pressure and provides a theoretical basis for selecting optimal processing parameters. In addition to the further clarification of the underlying damage mechanism, the laser shock post-processing provides a promising technique to realize the comprehensive and effective improvement of the laser-induced damage resistance of coatings.

中文翻译:

1ωHfO2/SiO2多层涂层抗激光损伤性能的新型激光冲击后处理技术

通过以冲击波的形式传播到样品中的激光诱导高压等离子体实施的激光冲击处理被创新地应用于 HfO 的后处理技术2/二氧化硅2首次采用多层涂层。纯机械后处理提供了激光诱导损伤阈值的显着促进作用的证据,在适当的加工参数下,该阈值增加了约 4.6 倍。促进机制被证实是内在缺陷和机械性能的综合改性,这使得这种新型后处理技术在各种类型的涂层上的适用性成为可能。通过实验建立了等离子体压力的相互作用方程,阐明了临界压力的存在,为选择最优工艺参数提供了理论依据。除了进一步阐明潜在的损害机制外,
更新日期:2021-05-14
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