Non-self-sustained electron beam RF-generated plasma in application for functional surface pretreatment,Plasma Processes and Polymers

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Non-self-sustained electron beam RF-generated plasma in application for functional surface pretreatment
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2021-05-14 , DOI: 10.1002/ppap.202100007
Alexander P. Palov ₁ , Olga V. Proshina ₁ , Tatyana V. Rakhimova ₁ , Alexander T. Rakhimov _{1,

2} , Ekaterina N. Voronina _{1,

2}

Affiliation

Simulation of non-self-sustained plasma generated by a 2-keV electron beam in Ar with radiofrequency (RF) biasing is carried out using a one-dimensional particle-in-cell Monte Carlo method. The effect of 10–30 mTorr gas pressure and different RF voltages of 0–45 V on the ion energy and angle distribution functions is analyzed and discussed. The performed ab initio dynamic simulations confirmed the possibility to eliminate methyl groups from the low-k surfaces with low-energy (10–20 eV) Ar ions, thereby turning these surfaces from hydrophobic into hydrophilic. The analytical model is developed to calculate the ion fluxes on two-dimensional trench walls and bottom for conditions under study. It was shown that plasma with a pressure of 10 mTorr and a bias voltage of ≤45 V is better suited for pretreatment of the low-k trench walls.

中文翻译：

非自持电子束射频产生等离子体在功能表面预处理中的应用

使用一维粒子单元蒙特卡罗方法模拟由具有射频 (RF) 偏置的 2 keV 电子束在 Ar 中产生的非自持等离子体。分析和讨论了 10-30 mTorr 气压和 0-45 V 不同射频电压对离子能量和角度分布函数的影响。执行的 ab initio 动态模拟证实了从低k 中消除甲基的可能性具有低能量（10-20 eV）Ar离子的表面，从而将这些表面从疏水变为亲水。该分析模型用于计算研究条件下二维沟槽壁和底部的离子通量。结果表明，具有 10 mTorr 压力和 ≤ 45 V 偏置电压的等离子体更适合于低k沟槽壁的预处理。

更新日期：2021-07-05

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