A high-throughput method was applied to study oxidation behavior of Nb–Si based alloy using composition spread alloy film as combinatorial libraries. An extended range of composition gradients of Nb–Si based alloy film was deposited by (multi)magnetron co-sputtering. The as-deposited film was composed of amorphous phase. Cr₂Nb, Nb₅Si₃ and Nb_ss could be detected after annealing treatment. After oxidation at 1250 ​°C for 10 ​min and 20 ​min, the film composition space was divided into three regions of the distinct oxide scales. The compositions for establishment of the different oxides on Nb–Si based alloy was defined efficiently across the entire composition space by the combinatorial libraries.

使用成分扩散合金膜作为组合库，采用高通量方法研究 Nb-Si 基合金的氧化行为。通过（多）磁控管共溅射沉积了更大范围的 Nb-Si 基合金膜的成分梯度。沉积的薄膜由非晶相组成。退火处理后可检出Cr ₂ Nb、Nb ₅ Si ₃和Nb _ss。在1250℃下氧化10分钟和20分钟后，薄膜成分空间被分成三个不同氧化皮的区域。用于在 Nb-Si 基合金上建立不同氧化物的成分通过组合库在整个成分空间中有效定义。