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Metal-semiconductor 1T/2H-MoS2 by a heteroatom-doping strategy for enhanced electrocatalytic hydrogen evolution
Catalysis Communications ( IF 3.4 ) Pub Date : 2021-05-14 , DOI: 10.1016/j.catcom.2021.106325
Yimin Jiang , Sihan Li , Fusheng Zhang , Weiyi Zheng , Liubin Zhao , Qingliang Feng

Complicated synthesis procedure and instability of 1T-MoS2 impede its practical application for hydrogen evolution reaction. Here, we propose a new strategy to drive the synthesis of stabilized 1T-MoS2 by Ni doping. Ni doping forms the Nisingle bondS covalent bonds, inducing the slip of S atoms and stabilizing 1T structure. The materials were characterized by transmission electron microscopy, X-ray photoelectron spectroscopy and Raman spectroscopy. Electrochemical tests including linear sweep voltammetry etc. indicate that the 1T/2H-MoS2/8%Ni has an overpotential of 162 mV and a Tafel slope of 80 mV dec−1 along with a good stability.



中文翻译:

金属半导体1T / 2H-MoS 2通过杂原子掺杂策略增强电催化氢的释放

1T-MoS 2的合成工艺复杂,不稳定,阻碍了其在析氢反应中的实际应用。在这里,我们提出了一种通过镍掺杂来驱动稳定的1T-MoS 2合成的新策略。Ni掺杂形成Ni 单键S共价键,诱导S原子滑移并稳定1T结构。通过透射电子显微镜,X射线光电子能谱和拉曼光谱对材料进行了表征。包括线性扫描伏安法等的电化学测试表明,1T / 2H-MoS 2 /8%Ni具有162 mV的过电势和80 mV dec -1的Tafel斜率以及良好的稳定性。

更新日期:2021-05-17
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