The vacuum-arc plasma-assisted method is used to deposit a multilayer coating based on Ti and Al in two discharge systems – in a traditional plasma-assisted vacuum-arc spraying system and in a gas-metal beam-plasma generation system in a hollow cathode of a non-self-sustained low pressure glow discharge. The coatings synthesized in these discharge schemes have close elemental and phase compositions. The aluminum content in the coating deposited in the plasma-beam formation is 8% lower, which is probably due to a higher overall average value of the ion flux density on the surface of the growing film in a non-self-sustained glow discharge. In the coating deposited by sputtering in a beam-plasma formation, no elements are part of the material of the sputtered hollow cathode. The gas-metal beam-plasma formations generated at low pressure are promising in the processes of functional coating deposition by the vacuum-arc plasma-assisted method.

真空电弧等离子体辅助方法用于在两个放电系统中沉积基于Ti和Al的多层涂层-在传统的等离子体辅助真空电弧喷涂系统中和在空心的气-金属束等离子体产生系统中非自持低压辉光放电的阴极。在这些放电方案中合成的涂层具有接近的元素和相组成。等离子体束形成中沉积的涂层中的铝含量降低了8％，这可能是由于非自持辉光放电中生长膜表面的离子通量密度的总体平均值较高所致。在通过束流等离子体形成的溅射沉积的涂层中，没有元素是溅射的空心阴极材料的一部分。