The manufacturing of multilayer films with improved mechanical and tribological properties has attracted attention recently for enabling their space applications. In this study, we aim to optimize the manufacturing process of WS_x/a-C multilayer films by alternately depositing WS₂, amorphous carbon (a-C), and Al metal on silicon substrates through magnetron sputtering. The microstructure and morphology of the multilayer films were investigated by x-ray diffractometry, scanning electron microscopy, and x-ray photoelectron spectroscopy. The mechanical and tribological properties of the films were evaluated in vacuum using a nanoindentation tester, ball-on-disk tribometer, and scratch tester. The results showed that the addition of an Al layer with an optimal thickness refined the microstructure of the films. The tribological properties of the films deteriorated with increasing thickness of the Al single layer. When the thickness of the Al film was 1 nm, the tribological properties of the films were optimal, and the adhesion was maximum (49.1 N). Hardness of the films gradually decreased with an increase in the thickness. Wear rate of the films decreased initially and then increased, and the wear rate was lowest when the thickness of the Al single layer was 2 nm (1.41 × 10⁻¹⁵ m³ N⁻¹ m⁻¹). By manufacturing films with optimal thickness, suitable tribological properties for vacuum applications can be achieved.

中文翻译：

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真空中带有Al亚层的WSx / aC多层膜的摩擦学性能增强

具有改善的机械和摩擦学性能的多层膜的制造近来引起人们的注意，以使其能够在空间上应用。在这项研究中，我们旨在通过交替沉积WS ₂来优化WS _x / aC多层膜的制造工艺。磁控溅射在硅基板上沉积非晶态碳（aC）和铝金属。通过X射线衍射法，扫描电子显微镜和X射线光电子能谱研究了多层膜的微观结构和形态。使用纳米压痕测试仪，圆盘球式摩擦计和划痕测试仪在真空中评估薄膜的机械和摩擦学性能。结果表明，添加具有最佳厚度的Al层可以改善薄膜的微观结构。随着Al单层厚度的增加，薄膜的摩擦学性能变差。当Al膜的厚度为1nm时，膜的摩擦学性能最佳，并且粘附力最大（49.1N）。膜的硬度随着厚度的增加而逐渐降低。^-15  m ³  N ^-1  m ^-1）。通过制造具有最佳厚度的薄膜，可以实现适用于真空应用的合适的摩擦学性能。