Application-specific optical glass properties are achieved by utilizing complex material compositions. This can be problematic in reactive plasma-assisted deterministic surface processing since a non-volatile surface layer may form depending on the glass composition, which affects the etch rate and thereby the local etching depth. In this investigation, a model algorithm is proposed to tackle some restrictions in applying fluorine-based plasma jet as etching tool utilized for freeform surface machining of optics made of complex glass composition, like borosilicate crown glass (e.g., N-BK7®). In this regard, firstly an analytical model is proposed for estimating the depth-dependent etch rate function. Subsequently, a recursive simulation algorithm is introduced for convolving the derived depth-dependent etch rate function with the given dwell time matrix to simulate a deterministic freeform generation process. By the proposed simulation algorithm, the impeding influence of the residual layer on the reduction of etching depth is computed prior to a real experiment in order to scale the local dwell time to ensure the targeted local removal. Finally, the simulated freeform shape is compared with the corresponding result of an etching experiment to validate the feasibility of the proposed approach.

通过利用复杂的材料成分可以实现特定用途的光学玻璃性能。这在反应性等离子体辅助的确定性表面处理中可能是有问题的，因为取决于玻璃组成可能会形成非易失性表面层，这会影响蚀刻速率，从而影响局部蚀刻深度。在这项研究中，提出了一种模型算法，以解决将氟基等离子体射流用作蚀刻工具的某些限制，该蚀刻工具用于对由复杂玻璃成分（例如硼硅酸盐冠玻璃）（例如N-BK7®）制成的光学器件进行自由表面加工。在这方面，首先提出用于估计与深度有关的蚀刻速率函数的分析模型。随后，引入了一种递归仿真算法，用于将导出的深度相关蚀刻速率函数与给定的停留时间矩阵进行卷积，以仿真确定性自由形式的生成过程。通过提出的仿真算法，在进行实际实验之前，要计算残余层对刻蚀深度减小的不利影响，以便确定局部停留时间，以确保有针对性地进行局部去除。最后，将模拟的自由形状与蚀刻实验的相应结果进行比较，以验证所提出方法的可行性。在实际实验之前，要计算残留层对蚀刻深度减少的不利影响，以便确定局部停留时间，以确保目标局部清除。最后，将模拟的自由形状与蚀刻实验的相应结果进行比较，以验证所提出方法的可行性。在实际实验之前，要计算残留层对蚀刻深度减少的不利影响，以便确定局部停留时间，以确保目标局部清除。最后，将模拟的自由形状与蚀刻实验的相应结果进行比较，以验证所提出方法的可行性。