In the present investigation, the undoped and La doped Cu_xO thin films are deposited on glass substrates by sol-gel spin coating method. The effect of various La doping concentrations on the chemical composition, morphological and optical properties of Cu_xO thin films have been extensively studied using X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM), Scanning electron microscopy (SEM), and UV–Vis diffuse spectrophotometer. The valence states of Cu, La and O have been identified by X-ray photoelectron spectroscopy (XPS) method. The AFM have demonstrated that the surface roughness of Cu_xO thin films decreases with increasing La concentration. Optical analyses have revealed that the optical band gap energy of Cu_xO thin films widens from 2.063 eV to 2.090 eV as the La concentration increases from 0% to 10%. Moreover, the Urbach energies, E_u, of the undoped and La substituted Cu_xO thin films have been determined.

在本研究中，未掺杂和La掺杂的Cu _x O薄膜通过溶胶-凝胶旋涂法沉积在玻璃基板上。使用X射线光电子能谱（XPS），原子力显微镜（AFM），扫描电子显微镜（SEM）广泛研究了各种La掺杂浓度对Cu _x O薄膜化学成分，形态和光学性质的影响，和紫外可见扩散分光光度计。Cu，La和O的化合价态已通过X射线光电子能谱法（XPS）进行了鉴定。原子力显微镜表明，Cu _x O薄膜的表面粗糙度随着La浓度的增加而降低。光学分析表明，Cu _x的带隙能为随着La浓度从0％增加到10％，O薄膜从2.063 eV扩大到2.090 eV。此外，已经确定了未掺杂和La取代的Cu _x O薄膜的乌尔巴赫能E _u。