Calibration of magnification and nonlinearity of scanning electron microscopy (SEM) is an essential task. In this paper, we proposed a new type of 1D grating sample fabricated by combining laser-focused atomic deposition and x-ray interference lithography as a lateral standard for calibrating SEMs. The calibrations of the grating pattern by a metrological large-range atomic force microscope indicate that the grating sample exhibits outstanding pattern uniformity that surpasses conventional samples fabricated by e-beam lithography: (1) the nonlinear deviation of the grating structures is below +/- 0.5 nm over a measurement range of 5 µm; (2) the maximal variation of the calibrated mean pitch values is lower than 0.01 nm at different locations randomly selected all over the pattern area. The proposed new sample is applied for accurately calibrating the magnification and nonlinearity of a commercial SEM, showing its advantages of easy-of-use and high accuracy. The influence of the defocus level of SEM on the calibration result is also demonstrated. This research offers a feasible solution for highly accurate SEM calibration needed for 3D nanometrology and hybrid metrology demanded in metrology of modern nanoelectronics devices and systems.

扫描电子显微镜（SEM）的放大倍率和非线性校准是必不可少的任务。在本文中，我们提出了一种新型的一维光栅样品，该样品是通过将激光聚焦原子沉积和x射线干涉光刻技术结合在一起作为校准SEM的横向标准而制成的。通过计量大范围原子力显微镜对光栅图案进行的校准表明，光栅样品具有出色的图案均匀性，超过了通过电子束光刻制造的常规样品：（1）光栅结构的非线性偏差低于+/-在5 µm的测量范围内为0.5 nm；（2）在整个图案区域内随机选择的不同位置处，校准的平均间距值的最大变化小于0.01 nm。所提出的新样品被用于精确校准商业SEM的放大倍率和非线性，显示出其易于使用和高精度的优点。还展示了SEM散焦水平对校准结果的影响。这项研究为3D纳米计量学和现代纳米电子设备和系统的计量学所需要的混合计量学提供了高精度SEM校准的可行解决方案。