Here, we report the use of a simple oxygen ion-beam etching process to fabricate polyimide moth-eye-like nanostructures as anti-reflection layers. The etching process formed moth-eye nanostructures directly onto polyimide layer surfaces that covered both flat and curved surfaces. Notably, this approach removed the need for a masking process, which reduced the number of separate fabrication steps compared with conventional methods that require repeated moth-eye etching on flat and hard materials, such as ceramics and curve surfaces. The proposed method formed moth-eyes through a single step etching process on both flat and curved substrates. The moth-eyes had an average height and pitch of approximately 700 and 100 nm, respectively, on a synthesized polyimide layer on both flat and curved substrates. The reflectivity of the fabricated polyimide moth-eye was as low as 0.2%–0.48%. The utility of the method to form anti-reflection layers in practical optical devices is also confirmed.

在这里，我们报告了使用简单的氧离子束蚀刻工艺来制造聚酰亚胺蛾眼状纳米结构作为抗反射层。蚀刻工艺将蛾眼纳米结构直接形成在覆盖平坦和弯曲表面的聚酰亚胺层表面上。值得注意的是，与需要在平坦和坚硬的材料（例如陶瓷和曲面）上反复进行蛾眼蚀刻的传统方法相比，该方法消除了对掩模工艺的需要，从而减少了单独的制造步骤。所提出的方法通过单步蚀刻工艺在平坦和弯曲的基板上形成了蛾眼。蛾眼在平坦和弯曲基板上的合成聚酰亚胺层上分别具有大约700和100 nm的平均高度和间距。制成的聚酰亚胺蛾眼的反射率低至0.2％-0.48％。还证实了在实际的光学装置中形成抗反射层的方法的实用性。