In this study, we developed a dry‐nano‐polishing technique using reactive ion etching for ultra thin titanium wafer. The surface of titanium coated with photoresist is polished by reactive ion etching using SF6 /C4F8 gas. Etching speed of titanium and photoresist were adjusted to close to each other by changing temperature and ratio of SF6 /C4F8 gas. By etching titanium under these conditions, the smooth surface shape of the resist was transferred to titanium. By combining with photolithography, it is possible to polish a specific part.

中文翻译：

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利用反应离子刻蚀对超薄钛晶片进行干纳米抛光技术的发展

在这项研究中，我们开发了一种使用反应离子刻蚀的超薄钛晶片干纳米抛光技术。通过使用SF6 / C4F8气体的反应性离子蚀刻对涂有光致抗蚀剂的钛表面进行抛光。通过改变温度和SF 6 / C 4 F 8气体的比例，将钛和光致抗蚀剂的蚀刻速度调整为彼此接近。通过在这些条件下蚀刻钛，抗蚀剂的光滑表面形状被转移到钛上。通过与光刻相结合，可以抛光特定的部分。