In this article, we report a detailed study on the influence of sputter power on physical properties of the NiO films grown by DC magnetron sputtering. Structural studies carried out by Grazing Incidence X-ray diffraction (XRD) reveals the polycrystalline nature of the films with FCC phase. The crystallographic orientation (111) plane followed by (200), (220), and (311) plane were evident from the XRD spectra. The average crystallites sizes were estimated from the spectra, and the values were compared using three different plots such as Scherrer, Williamson–Hall and size–strain plot. The surface morphology was carried out by atomic force microscopy. The deposited samples show semitransparent behavior in the visible region and the estimated band gap increased from 2.70 to 3.34 eV with an increase in sputter power. Furthermore, X-ray photoelectron spectroscopy (XPS) core-level Ni2p spectra were deconvoluted and the observed \({\text{Ni}}2{\text{p}}_{{{\text{3/2}}}}\), \({\text{Ni}}2{\text{p}}_{{1/2}}\) domain along with their satellite’s peaks were analyzed. Most importantly, XPS quantification data and Raman spectra confirm the presence of both \({\rm{Ni}}^{2+}\) and \({\rm{Ni}}^{3+}\) states in the NiO films. The electrical properties carried at room temperature revealed that the resistivity of the film significantly increased and a mobility of ~ 84 \({\rm{cm}}^{2}{\rm{V}}^{-1}{s}^{-1}\) was obtained.

在本文中，我们报告了有关溅射功率对通过直流磁控溅射法生长的NiO薄膜的物理性能的影响的详细研究。通过掠入射X射线衍射（XRD）进行的结构研究揭示了具有FCC相的膜的多晶性质。从XRD谱图可以明显看出结晶取向（111）平面，然后是（200），（220）和（311）平面。从光谱中估计平均晶粒尺寸，并使用三个不同的图（例如Scherrer，Williamson-Hall和尺寸-应变图）比较这些值。表面形态通过原子力显微镜进行。沉积的样品在可见光区域表现出半透明的行为，并且随着溅射功率的增加，带隙估计值从2.70 eV增加到3.34 eV。此外，\（{\ text {Ni}} 2 {\ text {p}} _ {{{\ text {3/2}}}} \），\（{\ text {Ni}} 2 {\ text {p} } _ {{1/2}} \）域及其卫星的峰值进行了分析。最重要的是，XPS定量数据和拉曼光谱确认了\（{\ rm {Ni}} ^ {2 +} \）和\（{{rm {Ni}} ^ {3 +} \）状态的存在。 NiO膜。在室温下进行的电性能表明，薄膜的电阻率显着提高，迁移率约为84 \（{\ rm {cm}} ^ {2} {\ rm {V}} ^ {-1} {s} ^ {-1} \）。