A model experimental approach, providing molecular scale insight into the build up mechanisms of a corrosion inhibiting interface, is reported. 2-mercaptobenzimidazole (2-MBI), a widely used organic inhibitor, was deposited from the vapor phase at ultra-low pressure on copper surfaces in chemically-controlled state, and X-ray photoelectron spectroscopy was used in situ to characterize the adsorption mechanisms upon formation of the inhibiting film. On copper surfaces prepared clean in the metallic state, the intact molecules lie flat at low exposure, with sulfur and both nitrogen atoms bonded to copper. A fraction of the molecules decomposes upon adsorption, leaving atomic sulfur on copper. At higher exposure, the molecules adsorb in a tilted position with sulfur and only one nitrogen bonded to copper, leading to a densification of 2-MBI in the monolayer. A bilayer is formed at saturation with the outer layer not bonded directly to copper. In the presence of a pre-adsorbed 2D oxide, oxygen is substituted and the molecules adsorb intactly without decomposition. A 3D oxide prevents the bonding of sulfur to copper. The molecular film formed on metallic and 2D oxide pre-covered surfaces partially desorbs and decomposes at temperature above 400 ^°C, leading to the adsorption of atomic sulfur on copper.

报道了一种模型实验方法，其提供了对腐蚀抑制界面的形成机理的分子尺度见解。2-巯基苯并咪唑（2-MBI）是一种广泛使用的有机抑制剂，在化学控制状态下以超低压从气相沉积在铜表面上，并使用X射线光电子能谱表征吸附机理在形成抑制膜时。在以金属状态清洁制备的铜表面上，完整的分子在低暴露下保持平坦，硫和两个氮原子均键合到铜上。一小部分分子在吸附时分解，在铜上留下原子硫。在较高的暴露水平下，分子在倾斜位置吸附了硫，只有一个氮与铜结合，导致单层中2-MBI的致密化。在外层不直接结合到铜的情况下形成饱和的双层。在预吸附的2D氧化物存在下，氧被取代，分子完整吸附而不分解。3D氧化物可防止硫与铜结合。在金属和2D氧化物预覆盖表面上形成的分子膜在400℃以上的温度下会部分脱附和分解 ^℃，导致原子硫在铜上的吸附。