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Screening of spherical moulds manufactured isotropically in plasma etching conditions
Contributions to Plasma Physics ( IF 1.3 ) Pub Date : 2021-04-27 , DOI: 10.1002/ctpp.202100023
Etienne Herth 1, 2 , Djaffar Belharet 2 , Samson Edmond 1 , David Bouville 1 , Laurent Robert 2 , Franck Lardet‐Vieudrun 2
Affiliation  

Micro-moulding is a critical rapid prototyping process chain used for a wide range of applications. This study demonstrates that it is possible to manufacture mould at low excitation frequency plasma (380 kHz), on a silicon substrate using fluorinated chemistry. According to the mask aperture designed and process time, the cavities profile characteristics, depending on the plasma chemistry, were analysed to predict the degree of anisotropy and the curvature. We show the possibility of creating curvature shapes with a desirable conic constant k of 1.25. In particular, we highlighted the smallest aperture sizes are more attractive for replicating optical micro-lens arrays using silicon moulds. Otherwise, the largest aperture sizes gain more attention for optoelectronics, microsystems, and microfluidics applications.

中文翻译:

筛选在等离子蚀刻条件下各向同性制造的球形模具

微成型是一种关键的快速成型工艺链,可用于广泛的应用。该研究表明,可以使用氟化化学在硅基板上以低激发频率等离子体 (380 kHz) 制造模具。根据设计的掩模孔径和处理时间,分析取决于等离子体化学性质的腔体轮廓特征,以预测各向异性的程度和曲率。我们展示了创建曲率形状的可能性,其理想的圆锥常数 k 为 1.25。特别是,我们强调了最小孔径尺寸对于使用硅模具复制光学微透镜阵列更具吸引力。否则,最大孔径尺寸会在光电子学、微系统和微流体应用中获得更多关注。
更新日期:2021-04-27
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