We demonstrate the fabrication of ultrahigh quality (Q) factor silica microdisk resonators on a silicon chip by inductively coupled plasma (ICP) etching. We achieve a dry-etched optical microresonator with an intrinsic Q factor as high as $1.94\times {10}^8$ from a 1-mm-diameter silica microdisk with a thickness of 4 μm. Our work provides a chip-based microresonator platform operating in the ultrahigh-Q region that will be useful in nonlinear photonics such as Brillouin lasers and Kerr microcombs.

中文翻译：

---

硅芯片上的干蚀刻超高Q石英微盘谐振器

我们演示了通过电感耦合等离子体（ICP）蚀刻在硅芯片上制造超高质量（Q）因子二氧化硅微盘谐振器。我们实现了干蚀刻光学微谐振器，其固有Q因子高达$1.94\times {10}^8$由直径为1毫米的硅胶微盘制成，厚度为4μm。我们的工作提供了一个在超高Q范围内运行的基于芯片的微谐振器平台，该平台将用于非线性光子学中，例如布里渊激光器和Kerr微梳子。