Patterning using a focused ionizing radiation beam provides a high spatial resolution but is not feasible when creating large arrays of microstructures. We propose the optimization of x-ray lithography parameters to create submicropores in a low-sensitivity material (polyethylene terephthalate) using a wide x-ray beam. This optimization results in the fabrication of regularly arranged micropores with a high aspect ratio (over 20) and diameters of up to 0.4 m across a large substrate area (up to several square centimeters).

中文翻译：

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用于制造大阵列高纵横比亚微米孔的 X 射线光刻条件优化

使用聚焦电离辐射束进行图案化提供了高空间分辨率，但在创建大型微结构阵列时不可行。我们建议优化 X 射线光刻参数，以使用宽 X 射线束在低灵敏度材料（聚对苯二甲酸乙二醇酯）中创建亚微孔。这种优化导致制造具有高纵横比（超过 20）和直径高达 0.4 的规则排列的微孔m 跨越大基板区域（最多几平方厘米）。