Mutual calibration by a combination of a zero-offset method and a length-unit traceable method has been suggested as a promising approach to determine the traceable thickness of ultra-thin oxide films. However, the measurement uncertainty is somewhat complicated to calculate because the standard uncertainties from the two measurement methods and the linear regression process should be combined. In this study, the mutual calibration method to evaluate the film thickness and uncertainty of ultra-thin oxide films was investigated. The algorithm of the linear regression equation in the mutual calibration method was studied and the uncertainty calculation program for the thickness measurement by mutual calibration was developed. The result will provide an effective and useful guideline to certify the thickness of the ultra-thin oxide film on Si(100) substrate which is used as the gate oxide in the semiconductor devices. The magnitude of the relative expanded uncertainty in the thickness measurement by mutual calibration is in the range from 8.6% to 9.3%.

通过零偏移法和长度单位可溯源法相结合的相互校准被认为是确定超薄氧化膜可溯源厚度的一种有前途的方法。然而，测量不确定度的计算有些复杂，因为两种测量方法的标准不确定度和线性回归过程应该结合起来。在本研究中，研究了评估超薄氧化膜的膜厚和不确定度的相互校准方法。研究了互校准法中线性回归方程的算法，开发了互校准测厚不确定度计算程序。结果将提供有效和有用的指南，以证明在半导体器件中用作栅极氧化物的 Si(100) 衬底上的超薄氧化膜的厚度。相互校准的厚度测量中相对扩展不确定度的大小在8.6%到9.3%的范围内。