This report gives the result of a bilateral comparison of resistance between the EMI (United Arab Emirates) and the BIPM carried out in 2020. Two 1 Ω and two 10 kΩ travelling standards belonging to the BIPM were used. The comparison was carried out with an 'A-B-A' pattern of measurements; the standards were measured first at the BIPM for a period of about one month, then for a period of about one month at the EMI, and finally again at the BIPM. The measurand was the 4 terminal dc resistance at low power. The BIPM was the pilot laboratory, and the comparison forms part of the ongoing BIPM key comparisons BIPM.EM-K13.a (for 1 Ω) and BIPM.EM-K13b (for 10 kΩ).

The results from the EMI and the BIPM were found to be in good agreement, with a difference D smaller than the relative expanded uncertainty Uc (95% confidence, k = 2) giving D = -0.057 10-6, Uc = 400 10-6 for 1 Ω and D = 0.017 10-6, Uc = 194 10-6 for 10 kΩ.

To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/.

The final report has been peer-reviewed and approved for publication by the CCEM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

本报告给出了 EMI（阿拉伯联合酋长国）和 BIPM 之间在 2020 年进行的电阻双边比较的结果。使用了属于 BIPM 的两个 1 Ω 和两个 10 kΩ 移动标准。比较是使用“ABA”测量模式进行的；这些标准首先在 BIPM 测量了大约一个月，然后在 EMI 测量了大约一个月，最后在 BIPM 再次测量。被测量是低功率下的 4 端直流电阻。BIPM 是试点实验室，比较构成正在进行的 BIPM 关键比较 BIPM.EM-K13.a（1 Ω）和 BIPM.EM-K13b（10 kΩ）的一部分。

发现 EMI 和 BIPM 的结果非常一致，差异 D 小于相对扩展不确定性 Uc（95% 置信度，k = 2），给出 D = -0.057 10-6，Uc = 400 10- 6 表示 1 Ω，D = 0.017 10-6，Uc = 194 10-6 表示 10 kΩ。

要访问本文的正文，请单击最终报告。请注意，此文本出现在 BIPM 密钥比较数据库 kcdb.bipm.org/ 的附录 B 中。

根据 CIPM 互认安排 (CIPM MRA) 的规定，最终报告已通过同行评审并由 CCEM 批准发布。