The electron affinity (EA) of a photoacid generator (PAG) is an important parameter for estimating the acid generation efficiency in a chemically amplified resist upon exposure to ionizing radiation such as EUV light and an electron beam because the electron attachment of PAG induces PAG decomposition and acid generation. In this study, EAs of ionic and non-ionic PAGs were estimated by density functional theory calculations using static and dynamic models. The former model indicated that radical anions are produced without changing the PAG structure even after electron attachment. The latter model indicated that the product structures are relaxed to their stable structures after electron attachment (dissociative electron attachment). By demonstrating the relationship between the EA and acid yield, the most preferable model was revealed.

光酸产生剂 (PAG) 的电子亲和势 (EA) 是评估化学放大抗蚀剂在暴露于电离辐射（例如 EUV 光和电子束）时产酸效率的重要参数，因为 PAG 的电子附着会诱导 PAG 分解和酸的产生。在这项研究中，使用静态和动态模型通过密度泛函理论计算来估计离子和非离子 PAG 的 EA。前一个模型表明，即使在电子附着后，产生的自由基阴离子也不会改变 PAG 结构。后一个模型表明产品结构在电子附着（解离电子附着）后松弛为其稳定结构。通过证明 EA 和酸产率之间的关系，揭示了最优选的模型。