Recently, main-chain-scission-type resists have attracted considerable interest because of their highly resolving properties. In this study, the effect of initial molecular weight distribution on the pattern formation of main-chain-scission-type resists was investigated. The main-chain-scission-type resists with different molecular weight distributions were prepared by blending ZEP520A (M _w, 56,000; M _w/M _n: 2.2) and ZEP7000 (M _w, 412 000; M _w/M _n, 2.6) of Zeon. Independently of their initial molecular weight distribution, the molecular weight distributions of the resists become similar through the random main-chain scission. However, the initial molecular weight distribution affected the formation of boundaries between lines and spaces. When their weight ratio was 1:1, the bridges formed by pattern collapse or transient swelling were clearly observed at an irradiation dose lower than those in the case of the other weight ratios.

最近，主链断裂型抗蚀剂因其高分辨特性而引起了相当大的兴趣。在这项研究中，研究了初始分子量分布对主链断裂型抗蚀剂图案形成的影响。通过将ZEP520A（M _w , 56,000; M _w / M _n : 2.2）和ZEP7000（M _w , 412 000; M _w / M _n, 2.6) 的吉翁。独立于它们的初始分子量分布，抗蚀剂的分子量分布通过随机主链断裂变得相似。然而，初始分子量分布影响线和空间之间边界的形成。当它们的重量比为 1:1 时，在照射剂量低于其他重量比的情况下，可以清楚地观察到由图案塌陷或瞬时膨胀形成的桥。