The molecular orientation and partial density of states were evaluated using NewSUBARU by soft X-ray absorption spectroscopy (XAS) and soft X-ray emission spectroscopy measurements. The degree of molecular alignment was degraded by increasing mesh temperature in hot mesh deposition (HMD), in other words, was changed from pentacene (Pn) to 6,13-dihydropentacene (DHP). At a mesh temperature of 1450 C, the different XAS was obtained due to the mixing effect of Pn and DHP, and presence of Pn oligomer. The HMD carbon film transformed into the graphite-like film and the graphene on the quartz substrate and the Ni/quartz substrate after soft X-ray irradiation, respectively. The HMD carbon film after soft X-ray irradiation showed the peaks due to terminal carbon such as CH _n and COOH in comparison with the reported large graphene sheet. It indicates that the flake size of the graphene on the Ni/quartz substrate was small and had many edges.

使用 NewSUBARU 通过软 X 射线吸收光谱 (XAS) 和软 X 射线发射光谱测量评估分子取向和部分态密度。分子排列的程度通过增加热网沉积 (HMD) 中的网温度而降低，换句话说，从并五苯 (Pn) 变为 6,13-​​二氢并五苯 (DHP)。在 1450 C 的筛网温度下，由于 Pn 和 DHP 的混合效应以及 Pn 低聚物的存在，获得了不同的 XAS。HMD碳膜在软X射线照射后分别转化为石英基片和Ni/石英基片上的类石墨膜和石墨烯。软 X 射线照射后的 HMD 碳膜显示出由于末端碳（如 CH _n）引起的峰 和 COOH 与报道的大石墨烯片相比。这表明 Ni/quartz 衬底上石墨烯的薄片尺寸很小并且有很多边缘。