Optical, structural and electrical properties of Au thin films (20, 40, 60, 80 and 100 nm) deposited on poly(vinyl chloride) substrates by sputtering process were investigated. The deposition of gold thin layers was carried out under low pressure at room temperature. UV/VIS characterization demonstrated the presence of surface plasmon peak corresponds to Au nano thin film at about 500–550 nm. The intensity of the peak was increased as the layer thickness increased. Structural investigation using FTIR technique illustrated that the deposited gold thin layer onto PVC surface was largely affected by the shape and position of the functional groups of PVC substrate. The electrical properties of PVC/sputtered gold thin films were investigated at room temperature over a wide range of frequency (20 Hz up to 5 × 10⁶ Hz). The dc conductivity increased from 2.63 × 10⁻¹⁴ S/m for pure PVC sample up to 9.54 × 10⁻¹³ S/m for 80 nm Au thin layer, while the resistance decreased from 3.17 × 10¹² (Ώ) down to 9.54 × 10¹⁰ (Ώ) (97% decrement).

研究了通过溅射法沉积在聚氯乙烯基板上的金薄膜（20、40、60、80和100 nm）的光学，结构和电学性质。金薄层的沉积在室温下在低压下进行。UV / VIS表征表明，表面等离激元峰的存在对应于约500–550 nm的金纳米薄膜。峰的强度随着层厚度的增加而增加。使用FTIR技术的结构研究表明，在PVC表面上沉积的金薄层在很大程度上受到PVC基材的官能团的形状和位置的影响。在室温下，在很宽的频率范围内（20 Hz至5×10 ^6）研究了PVC /溅射金薄膜的电性能。 赫兹）。直流电导率从纯PVC样品的2.63×10 ^-14 S / m增加到80 nm Au薄层的9.54×10 ^-13 S / m，电阻从3.17×10 ¹²（Ώ）降低到9.54× 10 ¹⁰（Ώ）（减少97％）。