Square patterns formed from the directed self-assembly of block copolymers,Molecular Systems Design & Engineering

当前位置： X-MOL 学术 › Mol. Syst. Des. Eng. › 论文详情

Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)

Square patterns formed from the directed self-assembly of block copolymers
Molecular Systems Design & Engineering ( IF 3.2 ) Pub Date : 2021-3-24 , DOI: 10.1039/d0me00168f
Weihua Li _{1,

2,

3,

4,

5} , Xueying Gu _{1,

2,

3,

4,

5}

Affiliation

Since tremendous progress has been made, directed self-assembly (DSA) of block copolymers has been regarded as one of the most promising bottom-up lithography techniques. In particular, DSA has been successfully applied to fabricate large-scale ordered stripes and hexagonal arrays of dots. More importantly, many efforts have been devoted to developing DSA strategies for the preparation of square patterns that are more in line with the needs of lithography in semiconductors. Here, we present a brief overview of recent progress in the DSA strategies for the fabrication of square patterns. Although numerous DSA strategies based on the simple AB diblock copolymer or ABC linear triblock copolymer have been developed, each strategy exhibits more or less disadvantages lying in poor long-range ordering, low density multiplication or difficulty with pattern transfer because of the intrinsic weaknesses in the bulk structures formed by these block copolymers. Very recently, self-consistent field theory studies revealed that a square array of cylinders can be stabilized in various AB-type block copolymers with purposely designed architectures. An efficient DSA strategy using these AB-type block copolymers could be developed for the fabrication of large-scale ordered square patterns in future, and will exhibit promising application prospects.

中文翻译：

由嵌段共聚物的定向自组装形成的正方形图案

由于取得了巨大的进步，嵌段共聚物的定向自组装（DSA）被认为是最有希望的自下而上的光刻技术之一。特别地，DSA已成功地应用于制造大规模的有序条纹和点的六边形阵列。更重要的是，已经进行了许多努力来开发DSA策略，以准备更符合半导体光刻要求的正方形图案。在此，我们简要概述了正方形图案制造的DSA策略的最新进展。尽管已经开发了许多基于简单AB二嵌段共聚物或ABC线性三嵌段共聚物的DSA策略，但每种策略都表现出或多或少的缺点，即长程有序，由于这些嵌段共聚物形成的本体结构存在固有的弱点，因此密度低，图案转移困难或图案转移困难。最近，自洽场理论研究表明，采用专门设计的结构，可以在各种AB型嵌段共聚物中稳定圆柱的方阵。将来可以开发出使用这些AB型嵌段共聚物的有效DSA策略来制造大规模有序正方形图案，并且将展现出广阔的应用前景。

更新日期：2021-04-13

点击分享查看原文

点击收藏

阅读更多本刊最新论文