An experimental investigation comparing the properties of plasma jets in dielectric barrier discharge (DBD) configurations using a powered electrode with and without a dielectric barrier, while keeping a second dielectric barrier over the grounded electrode, is reported in this work. For this purpose, two different power sources were used to produce the plasma jets, with one of them producing a pulsed high-voltage (HV) output and the other one producing a damped sine-wave HV output, which acts as a pulse-like power source. Measurements of plasma parameters were performed for both configurations using argon and helium as working gases. As a result, if the pulsed power source is used, significant differences were found in discharge power ( $P_{{\mathrm {dis}}}$ ) and rotational and vibrational temperatures ( $T_{r}$ and $T_{v}$ , respectively) when switching from one configuration to the other. On the other hand, using the pulse-like HV, only the $P_{{\mathrm {dis}}}$ parameter presented significant differences when switching the electrode’s configuration. For the pulsed source, it has been observed that despite the remarkable increase in $P_{{\mathrm {dis}}}$ when changing from the double barrier configuration to the single barrier one, the values obtained for $T_{r}$ and $T_{v}$ also increased, but not in the same proportion as the increase in $P_{{\mathrm {dis}}}$ , which suggests a nonlinear dependence between temperatures and discharge power in the plasma jet. As an example for application of plasmas in both configurations, tests in an attempt to remove copper films deposited on alumina substrates were performed and, as a result, there was significant material removal only when the powered electrode was in contact with the plasma. As a general conclusion, if higher power is really required for applications that do not involve in vivo targets, it is better to use this configuration.

中文翻译：

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使用和不接触等离子体的带电电极的DBD等离子体射流的特性

在这项工作中，进行了一项实验研究，比较了使用带电电极和不带电介质阻挡层的动力电极，同时在接地电极上保持第二个电介质阻挡层的情况下，比较等离子体射流在电介质阻挡层放电（DBD）配置中的性能。为此，使用了两种不同的电源来产生等离子体射流，其中一种产生脉冲高压（HV）输出，另一种产生阻尼正弦波HV输出，其作用类似于脉冲能量源。使用氩气和氦气作为工作气体，对两种配置进行了等离子体参数的测量。结果，如果使用脉冲电源，则会发现放电功率存在显着差异（ $ P _ {{\ mathrm {dis}}} $ ）以及旋转和振动温度（ $ T_ {r} $ 和 $ T_ {v} $ 从一种配置切换到另一种配置时）。另一方面，使用类似脉冲的HV，只有 $ P _ {{\ mathrm {dis}}} $ 切换电极配置时，该参数存在显着差异。对于脉冲源，已经观察到，尽管 $ P _ {{\ mathrm {dis}}} $ 从双屏障配置更改为单屏障配置时，获得的值 $ T_ {r} $ 和 $ T_ {v} $ 也增加了，但与增加的比例不同 $ P _ {{\ mathrm {dis}}} $ ，这表明等离子体射流中温度与放电功率之间存在非线性关系。作为在两种配置中施加等离子体的示例，进行了尝试去除沉积在氧化铝基板上的铜膜的测试，结果，只有在通电的电极与等离子体接触时，才可以有效去除材料。总的来说，如果不涉及的应用确实需要更高的功率体内 目标，最好使用此配置。