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Investigation on the Behavior of Electrons in the Bullet as Well as Its Dependence on Applied Voltage and H2O Concentration in the Atmospheric-Pressure Ar/H2O Plasma Jets
IEEE Transactions on Plasma Science ( IF 1.5 ) Pub Date : 2021-03-25 , DOI: 10.1109/tps.2021.3066571
Yufan Shi 1 , Zhenyu Tan 1 , Xinxian Chen 2 , Zihan Diao 1 , Xiaolong Wang 1
Affiliation  

This article presents a systematic investigation on the behavior of electrons in the bullet in the Ar/H 2 O plasma jet in increasing the applied voltage and water vapor concentration based on a needle-plate discharge configuration and a 1-D particle-in-cell Monte Carlo method. The scattering angle of the electron in the bullet is described using the angle between the electron scattering direction and the bullet propagation direction. The following results are obtained. The evolution characteristic of the angle spectrum of electrons in the bullet in increasing the applied voltage is the same as that in increasing water vapor concentration, namely, the electrons scattered toward the target get increasingly less. When increasing the applied voltage, the OH density, the electron density, and the average electron energy $E_{\mathrm {ave}}$ increase. However, the increase in water vapor concentration leads to an evidently increasing OH density and a decrease in both the electron density and $E_{\mathrm {ave}}$ . In the range of electron scattering angles below 90° in the bullet, the percentage of electrons with energy above 3.27 eV (the threshold of inducing dissociative electron attachment to water molecule) increases with increasing applied voltage but presents a slight decrease in increasing water vapor concentration. The majority of electrons to most probably interact with the target are of energies higher than 3.27 eV. Finally, a notable effect of H 2 O admixture is that it gives rise to the decrease in not only $E_{\mathrm {ave}}$ but also the electron density in the bullet, especially the latter decreases evidently.

中文翻译:

大气压Ar / H 2 O等离子射流中子弹中电子的行为及其对施加电压和H 2 O浓度的依赖性研究

本文对Ar / H 2中子弹中电子的行为进行了系统的研究。 O等离子体射流基于针板放电配置和一维单元内粒子蒙特卡洛方法提高了施加电压和水蒸气浓度。使用电子散射方向和子弹传播方向之间的角度描述子弹中电子的散射角。得到以下结果。子弹中电子的角度谱在增加施加电压时的演化特征与在增加水蒸气浓度中的演化特征相同,即,朝目标散射的电子变得越来越少。当增加施加电压时,OH密度,电子密度和平均电子能 $ E _ {\ mathrm {ave}} $ 增加。但是,水蒸气浓度的增加会导致OH浓度明显增加,而电子密度和电子密度均降低。 $ E _ {\ mathrm {ave}} $ 。在子弹中低于90°的电子散射角范围内,能量高于3.27 eV(诱导离解性电子附着于水分子的阈值)的电子百分比随施加电压的增加而增加,但水蒸气浓度的增加略有下降。与目标相互作用的大多数电子的能量都高于3.27 eV。最后,H 2 O外加剂的显着效果 是它不仅导致 $ E _ {\ mathrm {ave}} $ 而且子弹中的电子密度,尤其是子弹中的电子密度明显降低。
更新日期:2021-04-13
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