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Ion Acceleration Parameter of the Plasma Focus Device
IEEE Transactions on Plasma Science ( IF 1.5 ) Pub Date : 2021-03-26 , DOI: 10.1109/tps.2021.3065401
Mahmud Vahdat Roshan 1 , Seong Ling Yap 2 , Seong Shan Yap 3
Affiliation  

High-energy ion beam emission above megaelectronvolts from the plasma focus strongly correlated with the transient impedance developed across the plasma column. Ion acceleration parameter is formulated based on the experimental ion spectrum coupled to the pinch simulation, to estimate the mean ion energy $E_{mn}$ from the accelerating potential $V_{i}$ . The experimental plasma impedance of 200– $500~{\mathrm{ m}}\Omega $ sets off $E_{mn}=(3\to 8)V_{i}$ for sub-kJ to MJ-scale plasma focus devices. Adjustment of the parameter during the radiation phase speeds up or slows down $E_{mn}$ and therefore alters the acceleration characteristics of the plasma focus ion emissions. Simultaneously, extensive measures through the magnetic spectrometry along with the space charge formulation on a diode ensure a reasonable level of the data quality on plasma focus ion beams.

中文翻译:

等离子聚焦装置的离子加速参数

来自等离子体聚焦的兆伏以上的高能离子束发射与整个等离子体柱上产生的瞬态阻抗密切相关。根据实验离子光谱和收缩模拟,制定离子加速参数,以估算平均离子能量 $ E_ {mn} $ 从加速的潜力 $ V_ {i} $ 。实验血浆阻抗为200– $ 500〜{\ mathrm {m}} \ Omega $ 出发 $ E_ {mn} =(3至8)V_ {i} $ 适用于从千焦耳到兆焦耳的等离子聚焦设备。在辐射阶段调整参数会加快或减慢速度 $ E_ {mn} $ 因此改变了等离子体聚焦离子发射的加速特性。同时,通过电磁光谱的大量措施以及二极管上的空间电荷配方确保了等离子体聚焦离子束上数据质量的合理水平。
更新日期:2021-04-13
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