The structure and optical properties of titanium dioxide films have been studied during annealing from 100 to 400°C. The films were obtained by ion-plasma high-frequency magnetron sputtering of polycrystalline rutile target in an argon atmosphere. It was shown that as-prepared TiO₂ films are nanostructured with ~8 nm rutile crystallites and ~3.3 Å interplanar distances and contain a small fraction of anatase. The optical band gap of the films is 3.01 eV, and the refractive index under normal conditions is 2.25. The film annealing at tamperatures from 100 to 400°C does not practically change their structure, optical band gap, and refractive index under normal conditions, i.e., the obtained nanostructured TiO₂ films are thermally stable.

已经研究了在100至400°C的退火过程中二氧化钛薄膜的结构和光学性能。通过在氩气氛中对多晶金红石靶材进行离子等离子体高频磁控溅射来获得膜。结果表明，所制备的TiO ₂薄膜具有约8 nm金红石微晶和约3.3Å晶面距离的纳米结构，并且包含一小部分锐钛矿。薄膜的光学带隙为3.01 eV，正常条件下的折射率为2.25。在100至400℃的篡改下进行的膜退火在正常条件下实际上不改变其结构，光学带隙和折射率，即，所获得的纳米结构的TiO ₂膜是热稳定的。