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Practical measurement of the energy resolution for meV‐resolved inelastic X‐ray scattering
Journal of Synchrotron Radiation ( IF 2.4 ) Pub Date : 2021-04-09 , DOI: 10.1107/s1600577521003234
Daisuke Ishikawa , Alfred Q. R. Baron

Several different ways of measuring the energy resolution for meV‐resolved inelastic X‐ray scattering (IXS) are compared: using scattering from poly(methyl methacrylate), PMMA, using scattering from borosilicate glass (Tempax), and using powder diffraction from aluminium. All of these methods provide a reasonable first approximation to the energy resolution, but, also, in all cases, inelastic contributions appear over some range of energy transfers. Over a range of ±15 meV energy transfer there is good agreement between the measurements of PMMA and Tempax at low temperature, and room‐temperature powder diffraction from aluminium, so we consider this to be a good indication of the true resolution of our ∼1.3 meV spectrometer. The resolution over a wider energy range is self‐consistently determined using the temperature, momentum and sample dependence of the measured response. The inelastic contributions from the PMMA and Tempax, and their dependence on momentum transfer and temperature, are then quantitatively investigated. The resulting data allow us to determine the resolution of our multi‐analyzer array efficiently using a single scan. The importance of this procedure is demonstrated by showing that the results of the analysis of a spectrum from a glass are changed by using the properly deconvolved resolution function. The impact of radiation damage on the scattering from PMMA and Tempax is also discussed.

中文翻译:

MeV解析非弹性X射线散射的能量分辨率的实际测量

比较了几种不同的测量meV解析非弹性X射线散射(IXS)能量分辨率的方法:使用聚甲基丙烯酸甲酯(PMMA)的散射,硼硅酸盐玻璃(Tempax)的散射以及铝的粉末衍射。所有这些方法都为能量分辨率提供了合理的第一近似值,但是,在所有情况下,在一定范围的能量转移中都会出现非弹性贡献。在±15 meV的能量转移范围内,低温下的PMMA和Tempax的测量值与铝的室温粉末衍射之间有很好的一致性,因此我们认为这很好地表明了〜1.3的真实分辨率meV光谱仪。使用温度可以自如地确定较宽的能量范围内的分辨率,动量和样品对测量响应的依赖性。然后对PMMA和Tempax的非弹性贡献及其对动量传递和温度的依赖性进行了定量研究。结果数据使我们能够使用一次扫描有效地确定多分析仪阵列的分辨率。通过显示使用适当的反卷积分辨率函数可以改变玻璃光谱的分析结果,从而证明了此过程的重要性。还讨论了辐射损伤对PMMA和Tempax散射的影响。结果数据使我们能够使用一次扫描有效地确定多分析仪阵列的分辨率。通过显示使用适当的反卷积分辨率函数可以改变玻璃光谱的分析结果,从而证明了此过程的重要性。还讨论了辐射损伤对PMMA和Tempax散射的影响。结果数据使我们能够使用一次扫描有效地确定多分析仪阵列的分辨率。通过显示使用适当的反卷积分辨率函数可以改变玻璃光谱的分析结果,从而证明了此过程的重要性。还讨论了辐射损伤对PMMA和Tempax散射的影响。
更新日期:2021-05-06
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