Both speed and accuracy are key issues in nano-positioning. However, hysteresis existing in piezoelectric actuators severely reduces the positioning speed and accuracy. In order to address the hysteresis, a U-model based active disturbance rejection control is proposed. Based on the linear active disturbance rejection control, a controlled plant is dynamically transformed to be pure integrators. Then, according to the U-model control, a common inversion is obtained and the controlled plant is converted to be “1.” By integrating advantages of both linear active disturbance rejection control and U-model control, the U-model based active disturbance rejection control does promote the reference tracking speed and accuracy. Stability and steady-state error of the close-loop system have been analyzed. Phase lag between the system output and the control input has been effectively eliminated, and the phase-leading advantage of the U-model based active disturbance rejection control has been confirmed. Experimental results show that the U-model based active disturbance rejection control is capable of achieving faster and more accurate positioning. Remarkable improvements and practical realization make the U-model based active disturbance rejection control more promising in nano-positioning.

速度和准确性都是纳米定位的关键问题。但是，压电致动器中存在的磁滞严重降低了定位速度和精度。为了解决滞后问题，提出了一种基于U模型的主动抗扰度控制方法。基于线性有源干扰抑制控制，可将受控设备动态转换为纯积分器。然后，根据U模型控制，获得公共反转，并且将受控植物转换为“ 1”。通过集成线性主动干扰抑制控制和U模型控制的优势，基于U模型的主动干扰抑制控制确实提高了参考跟踪速度和精度。分析了闭环系统的稳定性和稳态误差。系统输出和控制输入之间的相位滞后已得到有效消除，并且基于U模型的主动干扰抑制控制的相位领先优势已得到确认。实验结果表明，基于U模型的主动干扰抑制控制能够实现更快，更准确的定位。显着的改进和实际实现使基于U模型的主动干扰抑制控制在纳米定位中更具前景。