The GdFe_1-xTi_xSi (x = 0–0.2) intermetallic compounds have been studied. They crystallize into the tetragonal CeFeSi (P4/nmm)–type structure. With increasing Ti content, the Curie temperature T_C and the lattice parameter c increase quickly for x = 0–0.1 and then, more moderate because of the solubility limit, whereas the saturation magnetization at 4 K and the lattice parameter a remain almost unchanged. The theoretical DFT + U calculations showed that the growth of Ti content affects the electronic structure of GdFe_1-xTi_xSi by significantly increasing the density of electron states at the Fermi level N(E_F). At the same time, the total magnetic moment does not change because both Fe and Ti are non-magnetic in these intermetallic compounds. The growth of the density of electron states near the Fermi level is accompanied by the rapid growth of T_C in the GdFe_1-xTi_xSi system.

已经研究了GdFe _{1- x} Ti _x Si（x  = 0-0.2）金属间化合物。它们结晶成四方CeFeSi（P 4 / nmm）型结构。随着Ti含量的增加，居里温度T _C和晶格参数c在x  = 0-0.1时迅速增加，然后由于溶解度极限而更加适中，而4 K时的饱和磁化强度和晶格参数a几乎保持不变。DFT + U理论计算表明，Ti含量的增长会影响GdFe _{1- x} Ti _x的电子结构。通过显着增加费米能级N（E _F）的电子态密度来提高Si含量。同时，总磁矩不会改变，因为在这些金属间化合物中，Fe和Ti都是非磁性的。电子态密度在费米能级附近的增长伴随着GdFe _{1- x} Ti _x Si系统中T _C的快速增长。